Fabrication-Compatible Photonic Structures for Ultra-Wide Visible Light Beam Shaping via Meta-Gratings

Konferenz: MikroSystemTechnik KONGRESS 2025 - Mikroelektronik/Mikrosystemtechnik und ihre Anwendungen – Nachhaltigkeit und Technologiesouveränität
27.10.2025-29.10.2025 in Duisburg, Germany

doi:10.30420/456614083

Tagungsband: MikroSystemTechnik Kongress 2025

Seiten: 4Sprache: EnglischTyp: PDF

Autoren:
Wang, Zhen; Theobald, Dominik; Tritschler, Patrick; Lemmer, Uli

Inhalt:
Precise and compact outcoupling of light from photonic integrated circuits (PICs) is a key requirement for the development of advanced on-chip optical sensing systems. While photonic receivers and detectors have miniaturized significantly, realizing large and uniform outcoupled beams, especially in the visible spectrum, remains challenging due to fabrication constraints limiting fine feature resolution. In this work, we present a design methodology for producing large-area grating structures that overcome these resolution limits by utilizing submicron-scale meta-gratings (MGs). Our approach replaces ultra-narrow binary grating features with fabrication-compatible geometries while preserving optical functionality. The result demonstrate a viable route for achieving visible-light beam shaping in integrated photonic systems while maintaining compatibility with existing fabrication technologies.