Optimized Si-DMS: Reducing Thermal Effects for More Accurate Measurements
Konferenz: MikroSystemTechnik KONGRESS 2025 - Mikroelektronik/Mikrosystemtechnik und ihre Anwendungen – Nachhaltigkeit und Technologiesouveränität
27.10.2025-29.10.2025 in Duisburg, Germany
doi:10.30420/456614095
Tagungsband: MikroSystemTechnik Kongress 2025
Seiten: 4Sprache: EnglischTyp: PDF
Autoren:
Frank, Thomas; Pobering, Sebastian; Hermann, Stefan; Gruen, Andre; Kermann, Manuel; Hintz, Michael; Cyriax, Andrea
Inhalt:
Silicon strain gauges (Si-DMS) offer up a to 40 times higher sensitivity than metallic strain gauges and exhibit minimal creep effects. Their manufacturing is cost-efficient in and enable more precise measurements. A key advantage is their temperature stability, particularly through optimized material and technology combinations. This article examines the minimization of thermal dependencies of the zero point and span. Si-DMS set new standards in sensor technology and enhance signal stability at high temperatures.

