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1

A Solution to Meet New Challenges on EBDW Data Prep

Authors:
Galler, R.; Melzer, D.; Nowotny, J.; Kroenert, K.; Krueger, M.; Suelzle, M.; Papenfuss, B.; Wagner, C.; Baetz, U.; Buerger, B.; Gramss, J.; Lemke, M.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

2

Advanced proximity matching with Pattern Matcher

Authors:
Serebryakov, Alexander; Brige, Lionel; Boisseau, Emmanuel; Peloquin, Eric; Coutellier, Vincent; Planchot, Jonathan
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

3

CDP - Application of focus drilling

Authors:
Geisler, S.; Bauer, J.; Haak, U.; Schulz, K.; Old, G.; Matthus, E.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

4

Contamination control for ArF photo masks

Authors:
Gordon, Joseph S.; Silova, Marianna; Connolly, Brid; Huijbregtse, Jeroen; Maxim, Nicolae; Frisa, Larry; Chovino, Christian; Weins, Colleen
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

5

CRYSTAL Project: A Contribution to control Cycle Time excursion in Litho area

Authors:
Tissier, Michel; Beisser, Eric; Davenet, Magali; Garcia, Patrick; Au, David; Quere, Yves; Finck, François; Silova, Mariana; Hoellein, Ingo
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

6

Decomposition Algorithm for Double Patterning of Contacts and Via Layers

Authors:
El-Gamal, A.; Al-Imam, M.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

7

Deflection Unit for Multi-Beam Mask Making

Authors:
Letzkus, Florian; Butschke, Joerg; Irmscher, Mathias; Jurisch, Michael; Klingler, Wolfram; Platzgummer, Elmar; Klein, Christof; Loeschner, Hans; Springer, Reinhard
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

8

Design Verification for sub 70 nm DRAM nodes via Metal Fix using E-Beam Direct Write

Authors:
Keil, K.; Jaschinsky, P.; Hohle, C.; Choi, K.-H.; Schneider, R.; Tesauro, M.; Thrum, F.; Zimmermann, R.; Kretz, J.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

9

Effects of mask absorber thickness on printability in EUV lithography with high resolution resist

Authors:
Kamo, Takashi; Aoyama, Hajime; Tanaka, Toshihiko; Suga, Osamu
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

10

Electron beam inspection methods for imprint lithography at 32 nm

Authors:
Selinidis, Kosta; Thompson, Ecron; Sreenivasan, S. V.; Resnick, Douglas J.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

11

Error-budget paradigms and laser mask pattern generator evolution

Authors:
Hamaker, H. Christopher; Jolley, Matthew J.; Berwick, Andrew D.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

12

EUV Actinic Defect Inspection and Defect Printability at sub-32 nm Half-pitch

Authors:
Huh, Sungmin; Kearney, Patrick; Wurm, Stefan; Goodwin, Frank; Han, Hakseung; Goldberg, Kenneth; Mochi, Iacopo; Gullikson, Eric
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

13

EUV and DUV scatterometry for CD and edge profile metrology on EUV masks

Authors:
Bodermann, Bernd; Wurm, Matthias; Diener, Alexander; Scholze, Frank; Groß, Hermann
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

14

EUV imaging performance – moving towards production

Authors:
Setten, Eelco van; Lok, Sjoerd; Dijk, Joep van; Kaya, Cemil; Schenau, Koen van Ingen; Feenstra, Kees; Meiling, Hans; Wagner, Christian
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

15

Extended Abbe approach for fast and accurate lithography imaging simulations

Authors:
Evanschitzky, P.; Erdmann, A.; Fühner, T.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

16

High Resolution Cell Projection

Authors:
Weidenmueller, U.; Hahmann, P.; Lemke, M.; Schnabel, B.; Pain, L.; Manakli, S.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

17

High speed (>100 Gbps) key components for a scalable optical data link, to be implemented in future maskless lithography applications

Authors:
Paraskevopoulos, A.; Voss, S.-H.; Talmi, M.; Walf, G.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

18

Improving yield and cycle time at the inspection process by means of a new defects disposition technique

Authors:
Villa, Ernesto; Sartelli, Luca; Miyashita, Hiroyuki; Sundermann, Frank; Gough, Stuart; Dufaye, Felix; Sippel, Astrid
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

19

Increasing inspection equipment productivity by utilizing Factory Automation SW on TeraScan 5XX systems

Authors:
Jakubski, Thomas; Piechocinski, Michal; Moses, Raphael; Bugata, Bharathi; Schmalfuss, Heiko; Köhler, Ines; Lisowski, Jan; Klobes, Jens; Fenske, Robert
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

20

Innovative processes investigation for photomask pod conditioning and drying

Authors:
Foray, J. M.; Rude, C.; Palisson, J.; Davenet, M.; Favre, A.; Cheung, D.; Dufaye, F.; Gough, S.; Richteiger, P.; Baudiquez, V.; Foca, E.; Nesladek, P.; Gopalakrishnan, S.; Hollein, K. Avary I.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference