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41

SEM image contrast modeling for mask and wafer metrology

Autoren:
Frase, C. G.; Gnieser, D.; Johnsen, K.-P.; Häßler-Grohne, W.; Tutsch, R.; Bosse, H.
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference

42

SEMATECH Mask Program

Autoren:
Yun, Henry; Rastegar, Abbas; Kearney, Patrick; Orvek, Kevin
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference

43

Sub-30 nm defect removal on EUV substrates

Autoren:
Rastegar, Abbas; Eichenlaub, Sean; Kadaksham, Arun John; House, Matt; Cha, Brian; Yun, Henry
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference

44

The task of EUV-reflectometry for HVM of EUV-masks: first steps

Autoren:
Farahzadi, Azadeh; Wies, Christian; Lebert, Rainer
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference

45

UV NIL template making and imprint evaluation

Autoren:
Sasaki, Shiho; Hiraka, Takaaki; Mizuochi, Jun; Sakai, Yuko; Yusa, Satoshi; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference