21
Electrical Test Structures for the Characterisation of Optical Proximity Correction
Autoren:
Tsiamis, Andreas; Smith, Stewart; McCallum, Martin; Hourd, Andrew C.; Stevenson, J. Tom M.; Waltona, Anthony J.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
22
Electron Beam Direct Write – Shaped Beam Overcomes Resolution Concerns
Autoren:
Stolberg, Ines; Pain, Laurent; Kretz, Johannes; Boettcher, Monika; Doering, Hans-Joachim; Gramss, Juergen; Hahmann, Peter
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
23
Electron beam directed repair of fused silica imprint templates
Autoren:
Schmid, Gerard M.; Resnick, Douglas J.; Fettig, Rainer; Edinger, Klaus; Young, Steven R.; Dauksher, William J.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
24
Electron beam lithography simulation based on a single convolution approach – Application for sub-45nm nodes
Autoren:
Le denmat, J. C.; Manakli, S.; Icard, B.; Soonekindt, C.; Minghetti, B.; Le borgne, O.; Pain, L.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
25
Enabling Defect-free Masks for Extreme Ultraviolet Lithography
Autoren:
Jeon, Chan-Uk; Kearney, Patrick; Ma, Andy; Randive, Rajul; Reiss, Ira; Beier, Bernd; Uno, Toshiyuki
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
26
EUV mask infrastructure challenges
Autoren:
Wurm, Stefan; Seidel, Phil; Peski, Chris Van; He, Long; Han, Hakseung; Kearney, Pat; Cho, Wonil
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
27
Evaluation of an alternative UV-NIL mold fabrication process
Autoren:
Voisin, P.; Voisin, P.; Voisin, P.; Leveder, T.; Zelsmann, M.; Gourgon, C.; Boussey, J.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
28
Fast near field simulation of optical and EUV masks using the waveguide method
Autoren:
Evanschitzky, Peter; Erdmann, Andreas
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
29
First Measurement Data Obtained On The New Vistec LMS IPRO4
Autoren:
Adam, Dieter; Boesser, Artur; Heiden, Michael; Bender, Jochen; Laske, Frank; Röth, Klaus-Dieter
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
30
Focused Electron Beam Induced Deposition of DUV transparent SiO2
Autoren:
Perentes, Alexandre; Hoffmann, Patrik; Munnik, Frans
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
31
Hybrid nanoimprint for micro-nano mixture structure
Autoren:
Okuda, Keisuke; Niimi, Naoyuki; Kawata, Hiroaki; Hirai, Yoshihiko
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
32
Hydrogenated water application for particle removal on EUV mask blank substrates
Autoren:
Eichenlaub, Sean; Rastegar, Abbas; Dress, Peter; Xu, Fei; Marmillion, Pat
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
33
Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer(TM)
Autoren:
Eklund, Robert; Österberg, Anders; Hellgren, Jonas; Fosshaug, Hans; Karlin, Tord; Newman, Tom
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
34
Improvement of Model Kernel Representation in Process Simulation by Taking Pattern Correlation into account
Autoren:
Li, Jianliang; Yan, Qiliang; Melvin III, Lawrence S.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
35
Innovative Application of the RCWA Method for the Ultra-Sensitive Transmittance-Based CD Measurements on Phase-Shift Masks
Autoren:
Gray, Alexander; Lam, John C.; Chen, Stanley
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
36
Investigation of capillary bridges growth in NIL process
Autoren:
Landis, Stefan; Leveder, Tanguy; Chaix, Nicolas; Gourgon, Cecile
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
37
Investigation of Hyper-NA Scanner Emulation for Photomask CDU Performance
Autoren:
Poortinga, Eric; Scheruebl, Thomas; Conley, Will; Sundermann, Frank
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
38
Investigation on Immersion Defectivity Root Cause
Autoren:
Farys, V.; Gaugiran, S.; Cruau, D.; Mestadi, K.; Warrick, S.; Benndorf, M.; Feilleux, R.; Sourd, C.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
39
Mask Industry Assessment Trend Analysis 2006
Autoren:
Shelden, Gilbert; Marmillion, Patricia
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
40
Mask qualification strategies in a wafer fab
Autoren:
Jaehnert, Carmen; Kunowski, Angela
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference