IEC 62047-1:2016

Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions

IEC 62047-16:2015

Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods

IEC 62047-17:2015

Semiconductor devices - Micro-electromechanical devices - Part 17: Bulge test method for measuring mechanical properties of thin films

IEC 62047-20:2014

Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes

IEC 62047-21:2014

Semiconductor devices - Micro-electromechanical devices - Part 21: Test method for Poisson's ratio of thin film MEMS materials

IEC 62047-22:2014

Semiconductor devices - Micro-electromechanical devices - Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates

IEC 62047-11:2013

Semiconductor devices - Micro-electromechanical devices - Part 11: Test method for coefficients of linear thermal expansion of free-standing materials for micro-electromechanical systems

IEC 62047-18:2013

Semiconductor devices - Micro-electromechanical devices - Part 18: Bend testing methods of thin film materials

IEC 62047-19:2013

Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses

IEC 60747-16-5:2013

Semiconductor devices - Part 16-5: Microwave integrated circuits - Oscillators

IEC TR 62258-4:2012

Semiconductor die products - Part 4: Questionnaire for die users and suppliers

IEC 62047-5:2011/COR1:2012

Corrigendum 1 - Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches

IEC 62047-9:2011/COR1:2012

Corrigendum 1 - Semiconductor devices - Micro-electromechanical devices - Part 9: Wafer to wafer bonding strength measurement for MEMS

IEC 62047-13:2012

Semiconductor devices - Micro-electromechanical devices - Part 13: Bend - and shear - type test methods of measuring adhesive strength for MEMS structures

IEC 62047-14:2012

Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials

IEC 62047-10:2011/COR1:2012

Corrigendum 1 - Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials

IEC 62047-12:2011

Semiconductor devices - Micro-electromechanical devices - Part 12: Bending fatigue testing method of thin film materials using resonant vibration of MEMS structures

IEC 62047-10:2011

Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials

IEC 62047-5:2011

Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches

IEC 62047-9:2011

Semiconductor devices - Micro-electromechanical devices - Part 9: Wafer to wafer bonding strength measurement for MEMS