1
A Correlation for Predicting Film Pulling Velocity in Immersion Lithography
Autoren:
Schuetter, Scott; Shedd, Timothy; Doxtator, Keith; Nellis, Gregory; Peski, Chris Van
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
2
A New Generation of Progressive Mask Defects on the Pattern Side of Advanced Photomasks
Autoren:
Grenon, Brian J.; Bhattacharyya, Kaustuve; Eynon, Benjamin
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
3
A new life for a 10-year old MueTec2010, CD measurement system: the ultimate precision upgrade, with additional film thickness measurement capability
Autoren:
Cassol, Gian Luca; Bianucci, Giovanni; Murai, Shiaki; Falk, Günther; Scheuring, Gerd; Döbereiner, Stefan; Brück, Hans-Jürgen
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
4
A Novel Method for the Deposition of Ultra-Uniform Resist Film for Mask Making
Autoren:
Schneider, J.; Picard, G.; Seye, M. F.; Pérez, Maria Helena
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
5
A technique to determine capability to detect adjacent defects during the die-to-database inspection of reticle patterns
Autoren:
Avakaw, Syarhei; Korneliuk, Aliaksandr; Tsitko, Alena
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
6
Analysis method to determine and characterize the mask mean-to-target and uniformity specification
Autoren:
Lee, Sung-Woo; Leunissen, Leonardus H. A.; Kerkhove, Jeroen Van de; Philipsen, Vicky; Jonckheere, Rik; Lee, Suk-Joo; Woo, Sang-Gyun; Cho, Han-Ku; Moon, Joo-Tae
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
7
Assist Feature Placement Analysis Using Focus Sensitivity Models
Autoren:
Melvin III, Lawrence S.; Mayhew, Jeffrey P.; Painter, Benjamin D.; Barnes, Levi D.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
8
Calibration of test masks used for lithography lens systems
Autoren:
Arnz, M.; Häßler-Grohne, W.; Bodermann, B.; Bosse, H.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
9
CD and Profile Metrology of Embedded Phase shift masks using Scatterometry
Autoren:
Lee, Kyung man; Yedur, Sanjay; Hetzer, Dave; Tavassoli, Malahat; Baik, Kiho
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
10
Characterizing the Response of an EUV Reticle during Electrostatic Chucking
Autoren:
Engelstad, Roxann L.; Lovell, Edward G.; Mikkelson, Andrew R.; Nataraju, Madhura; Ramaswamy, Vasu; Sohn, Jaewoong; Dicks, Gerald A.; Abdo, Amr Y.; Tejeda, Richard O.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
11
Consequences of Plasmonic Effects in Photomasks
Autoren:
Schellenberg, F. M.; Adam, K.; Matteo, J.; Hesselink, L.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
12
Data Prep – The Bottleneck of Future Applications?
Autoren:
Gramss, Juergen; Eichhorn, Hans; Lemke, Melchior; Jaritz, Renate; Neick, Volker; Beyer, Dirk; Buerger, Bertram; Baetz, Ulrich; Kunze, Klaus; Belic, Nikola
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
13
Design for Manufacturing Validation Tool - Fast and Reliable Conversion of SEM Images to GDS Images
Autoren:
Ronning, D.; Ducharme, D.; Selzer, R.; Boerger, B.; Yu, M.; Xing, B.; Trybendis, M.; Grenon, B.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
14
Evaluation of quartz dry etching profile for the PSM lithography performance
Autoren:
Komizo, Toru; Nemoto, Satoru; Kojima, Yosuke; Ohshima, Takashi; Yoshii, Takashi; Konishi, Toshio; Chiba, Kazuaki; Kikuchi, Yasutaka; Otaki, Masao; Okuda, Yoshimitsu
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
15
High Resolution Holographic Lithography
Autoren:
Bratsev, V. F.; Ochkur, V. I.; Rakhovsky, V. I.; Tolmachev, Yu. A.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
16
How Refractive Microoptics Enable Lossless Hyper-NA Illumination Systems for Immersion Lithography
Autoren:
Ganser, H.; Darscht, M.; Miklyaev, Y.; Hauschild, D.; Aschke, L.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
17
Iso-sciatic point: novel approach to distinguish 3-D mask effects from scanner aberrations in extreme ultraviolet lithography
Autoren:
Leunissen, Leonardus H. A.; Gronheid, Roel; Gao, Weimin
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
18
Laser Mask Repair for Advanced Technologies
Autoren:
Dinsdale, Andrew; Robinson, Tod; Jeff LeClaire1; White, Roy; Bozak, Ron; Lee, David A.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
19
Manufacturability and printability of AAPSM with transparent etch stop layer
Autoren:
Cangemi, Michael; Philipsen, Vicky; Ruyter, Rudi De; Leunissen, Leonardus; Morgana, Nicolo; Sixt, Pierre; Cangemi, Marc; Cottle, Rand; Kasprowicz, Bryan
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference
20
Mask absorber material dependence of 2D OPC in 193nm high NA lithography
Autoren:
Cheng, Wen-Hao; Farnsworth, Jeff
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference