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1

A Correlation for Predicting Film Pulling Velocity in Immersion Lithography

Autoren:
Schuetter, Scott; Shedd, Timothy; Doxtator, Keith; Nellis, Gregory; Peski, Chris Van
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

2

A New Generation of Progressive Mask Defects on the Pattern Side of Advanced Photomasks

Autoren:
Grenon, Brian J.; Bhattacharyya, Kaustuve; Eynon, Benjamin
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

3

A new life for a 10-year old MueTec2010, CD measurement system: the ultimate precision upgrade, with additional film thickness measurement capability

Autoren:
Cassol, Gian Luca; Bianucci, Giovanni; Murai, Shiaki; Falk, Günther; Scheuring, Gerd; Döbereiner, Stefan; Brück, Hans-Jürgen
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

4

A Novel Method for the Deposition of Ultra-Uniform Resist Film for Mask Making

Autoren:
Schneider, J.; Picard, G.; Seye, M. F.; Pérez, Maria Helena
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

5

A technique to determine capability to detect adjacent defects during the die-to-database inspection of reticle patterns

Autoren:
Avakaw, Syarhei; Korneliuk, Aliaksandr; Tsitko, Alena
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

6

Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Autoren:
Lee, Sung-Woo; Leunissen, Leonardus H. A.; Kerkhove, Jeroen Van de; Philipsen, Vicky; Jonckheere, Rik; Lee, Suk-Joo; Woo, Sang-Gyun; Cho, Han-Ku; Moon, Joo-Tae
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

7

Assist Feature Placement Analysis Using Focus Sensitivity Models

Autoren:
Melvin III, Lawrence S.; Mayhew, Jeffrey P.; Painter, Benjamin D.; Barnes, Levi D.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

8

Calibration of test masks used for lithography lens systems

Autoren:
Arnz, M.; Häßler-Grohne, W.; Bodermann, B.; Bosse, H.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

9

CD and Profile Metrology of Embedded Phase shift masks using Scatterometry

Autoren:
Lee, Kyung man; Yedur, Sanjay; Hetzer, Dave; Tavassoli, Malahat; Baik, Kiho
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

10

Characterizing the Response of an EUV Reticle during Electrostatic Chucking

Autoren:
Engelstad, Roxann L.; Lovell, Edward G.; Mikkelson, Andrew R.; Nataraju, Madhura; Ramaswamy, Vasu; Sohn, Jaewoong; Dicks, Gerald A.; Abdo, Amr Y.; Tejeda, Richard O.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

11

Consequences of Plasmonic Effects in Photomasks

Autoren:
Schellenberg, F. M.; Adam, K.; Matteo, J.; Hesselink, L.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

12

Data Prep – The Bottleneck of Future Applications?

Autoren:
Gramss, Juergen; Eichhorn, Hans; Lemke, Melchior; Jaritz, Renate; Neick, Volker; Beyer, Dirk; Buerger, Bertram; Baetz, Ulrich; Kunze, Klaus; Belic, Nikola
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

13

Design for Manufacturing Validation Tool - Fast and Reliable Conversion of SEM Images to GDS Images

Autoren:
Ronning, D.; Ducharme, D.; Selzer, R.; Boerger, B.; Yu, M.; Xing, B.; Trybendis, M.; Grenon, B.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

14

Evaluation of quartz dry etching profile for the PSM lithography performance

Autoren:
Komizo, Toru; Nemoto, Satoru; Kojima, Yosuke; Ohshima, Takashi; Yoshii, Takashi; Konishi, Toshio; Chiba, Kazuaki; Kikuchi, Yasutaka; Otaki, Masao; Okuda, Yoshimitsu
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

15

High Resolution Holographic Lithography

Autoren:
Bratsev, V. F.; Ochkur, V. I.; Rakhovsky, V. I.; Tolmachev, Yu. A.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

16

How Refractive Microoptics Enable Lossless Hyper-NA Illumination Systems for Immersion Lithography

Autoren:
Ganser, H.; Darscht, M.; Miklyaev, Y.; Hauschild, D.; Aschke, L.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

17

Iso-sciatic point: novel approach to distinguish 3-D mask effects from scanner aberrations in extreme ultraviolet lithography

Autoren:
Leunissen, Leonardus H. A.; Gronheid, Roel; Gao, Weimin
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

18

Laser Mask Repair for Advanced Technologies

Autoren:
Dinsdale, Andrew; Robinson, Tod; Jeff LeClaire1; White, Roy; Bozak, Ron; Lee, David A.
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

19

Manufacturability and printability of AAPSM with transparent etch stop layer

Autoren:
Cangemi, Michael; Philipsen, Vicky; Ruyter, Rudi De; Leunissen, Leonardus; Morgana, Nicolo; Sixt, Pierre; Cangemi, Marc; Cottle, Rand; Kasprowicz, Bryan
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference

20

Mask absorber material dependence of 2D OPC in 193nm high NA lithography

Autoren:
Cheng, Wen-Hao; Farnsworth, Jeff
Konferenz:
EMLC 2006 - 22nd European Mask and Lithography Conference