1
?omplete set of the special process equipment for the defect-free production of reticles
Autoren:
Avakaw, Syarhei; Iouditski, Valerian; Pushkin, Leanid; Tsitko, Alena
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
2
A Cost Model Comparing Image Qualification Using Test Wafer and Direct Mask Inspection
Autoren:
Bhattacharyya, Kaustuve; Hazari, Viral; Sutherland, Doug; Higashiki, Tatsuhiko
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
3
A novel model building flow for the simulation of proximity effects of mask processes
Autoren:
Mas, Jonathan; Mittermeier, Engelbert
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
4
Accelerating Physical Verification Using STPRL: a Novel Language for Test Pattern Generation
Autoren:
Nouh, Ahmed
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
5
Achieving Mask Order Processing Automation, Interoperability and Standardization based on P10
Autoren:
Rodriguez, B.; Filies, O.; Sadran, D.; Tissier, Michel; Albin, D.; Stavroulakis, S.; Voyiatzis, E.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
6
Actinic inspection of sub-50 nm EUV mask blank defects
Autoren:
Lin, Jingquan; Weber, Nils; Maul, Jochen; Rott, Karsten; Hendel, Stefan; Merkel, Michael; Schoenhense, Gerd; Kleineberg, Ulf
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
7
Aerial Imaging Performance of ALTA4700 Printed Mask for 130nm Design Rule
Autoren:
Hsu, Jyh Wei; Wu, Chun Hung; Cheng, Kevin
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
8
An Empirical Approach Addressing the Transfer of Mask Placement Errors During Exposure
Autoren:
Alles, B.; Simeon, B.; Cotte, E.; Wandel, T.; Schulz, B.; Seltmann, R.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
9
Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
Autoren:
Jonckheere, R.; Lorusso, G. F.; Goethals, A.; Ronse, K.; Hermans, J.; Ruyter, R. De
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
10
Benchmark and gap analysis of current mask carriers vs future requirements: example of the carrier contamination
Autoren:
Fontaine, H.; Davenet, M.; Cheung, D.; Hoellein, I.; Richsteiger, P.; Dejaune, P.; Torsy, A.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
11
Birefringence variation of quartz substrates during mask process
Autoren:
Morikawa, Yasutaka; Kitahata, Yasuhisa; Yokoyama, Toshifumi; Yokoyama, Toshifumi; Kikuchi, Toshiharu; Kawaguchi, Atsushi; Ohkubo, Yasushi
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
12
Calibration of CD mask standards for the 65 nm node: CoG and MoSi
Autoren:
Richter, J.; Heins, T.; Liebe, R.; Bodermann, B.; Diener, A.; Bergmann, D.; Frase, C. G.; Bosse, H.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
13
Challenges of residual layer minimisation in thermal nanoimprint lithography
Autoren:
Bogdanski, Nicolas; Wissen, Matthias; Möllenbeck, Saskia; Scheer, Hella-Christin
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
14
Characteristics optimization of mask materials for Hyper-NA lithography
Autoren:
Morikawa, Yasutaka; Suto, Takanori; Nagai, Takaharu; Inazuki, Yuichi; Adachi, Takashi; Kitahata, Yasuhisa; Yokoyama, Toshifumi; Toyama, Nobuhito; Mohri, Hiroshi; Hayashi, Naoya
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
15
Characterization of photo masks by X3D AFM
Autoren:
Froeck, C.; Ho, M.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
16
Contact angles and liquid loss behavior of high index fluids
Autoren:
Harder, Paul M.; Shedd, Timothy A.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
17
Current status of water immersion lithography and prospect of higher index method
Autoren:
Owa, Soichi; Nakano, Katsushi; Nagasaka, Hiroyuki; Kohno, Hirotaka; Ohmura, Yasuhiro; McCallum, Martin
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
18
Damage free megasonic resonance cleaning for the 45nm design rule
Autoren:
Osbome, Steve; Baudiquez, Valentine; Rode, Thomas; Chovino, Christian; Takahashi, Hidekazu; Woster, Eric
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
19
Data Preparation for EBDW
Autoren:
Thrum, Frank; Kretz, Johannes; Lutz, Tarek; Keil, Katja; Arndt, Christian; Choi, Kang-Hoon; Baetz, Ullrich; Belic, Nikola; Lemke, Melchior; Denker, Ulrich; Gramss, Juergen; Kliem, Karl-Heinz
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
20
Effects of heat curing on adhesive strength between microsized SU-8 and Si substrate
Autoren:
Ishiyama, C.; Sone, M.; Higo, Y.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference