1
3-Dimensional bridged structures by thermal-UV imprint using a novel mask
Autoren:
Okuda, Keisuke; Kawata, Hiroaki; Hirai, Yoshihiko
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
2
45nm Node Registration Metrology on LTEM EUV Reticles
Autoren:
Laske, Frank; Kinoshita, Hiroshi; Nishida, Naoki; Kenmochi, Daisuke; Ota, Hitoshi; Tanioka, Yukitake; Czerkas, Slawomir; Schmidt, Karl-Heinrich; Adam, Dieter; Roeth, Klaus-Dieter
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
3
Advances in Fabrication of X-ray Masks based on Vitreous Carbon using a new UV sensitive positive Resist
Autoren:
Voigt, Anja; Kouba, Josef; Heinrich, Marina; Gruetzner, Gabi; Scheunemann, Heinz-Ulrich; Rudolph, I.; Waberski, Christoph
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
4
Alternative Approach to Transparent Stamps for UV-based Nanoimprint Lithography – Techniques and Materials
Autoren:
Klukowska, Anna; Vogler, Marko; Kolander, Anett; Reuther, Freimut; Gruetzner, Gabi; Muehlberger, Michael; Bergmair, Iris; Schoeftner, Rainer
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
5
Assessment and application of focus drilling for DRAM contact hole fabrication
Autoren:
Noelscher, Christoph; Jauzion-Graverolle, Franck; Henkel, Thomas
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
6
Assessment of molecular contamination in mask pod
Autoren:
Foray, Jean Marie; Dejaune, Patrice; Sergent, Pierre; Gough, Stuart; Davene, Magali; Favre, Arnaud; Rude, C.; Trautmann, T.; Tissier, Michel; Cheung, D.; Fontaine, H.; Veillerot, M.; Avary, K.; Hollein, I.; Lerit, R.
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
7
CDO Budgeting
Autoren:
Nesladek, Pavel; Wiswesser, Andreas; Sass, Björn; Mauermann, Sebastian
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
8
Characterizing the imaging performance of Flash Memory masks using AIMS(TM)
Autoren:
Setten, Eelco van; Wismans, Onno; Grim, Kees; Finders, Jo; Dusa, Mircea; Birkner, Robert; Richter, Rigo; Scherübl, Thomas
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
9
Comparative scatterometric CD and edge profile measurements on a MoSi mask using different scatterometers
Autoren:
Wurm, M.; Diener, A.; Bodermann, B.
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
10
Controlling Linewidth Roughness in Step and Flash Imprint Lithography
Autoren:
Schmid, Gerard M.; Khusnatdinov, Niyaz; Brooks, Cynthia B.; LaBrake, Dwayne; Thompson, Ecron; Resnick, Douglas J.; Owens, Jordan; Ford, Arnie; Sasaki, Shiho; Toyama, Nobuhito; Kurihara, Masaaki; Hayashi, Naoya; Kobayashi, Hideo; Sato, Takashi; Nagarekawa, Osamu; Hart, Mark W.; Gopalakrishnan, Kailash; Shenoy, Rohit; Jih, Ron; Zhang, Ying; Sikorski, Edmund; Rothwell, Mary Beth; Yoshitake, Shusuke; Sunaoshi, Hitoshi; Yasui, Kenichi
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
11
Design of pattern-specific mask grating for giving the effect of an off-axis illumination
Autoren:
Kim, Young-Seok; Song, Seok Ho; Lee, Jong Ung; Oh, Sung Hyun; Choi, Yong Kyoo; Kim, Munsik; O, Beom-Hoan; Park, Se-Geun; Lee, El-Hang; Lee, Seung Gol
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
12
Desired IP Control methodology for EUV Mask in Current Mask Process
Autoren:
Yoshitake, S.; Yoshitake, S.; Tamamushi, S.; Ogasawara, M.
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
13
Double Exposure Technology for KrF Lithography
Autoren:
Geisler, S.; Bauer, J.; Haak, U.; Stolarek, D.; Schulz, K.; Wolf, H.; Meier, W.; Trojahn, M.; Matthus, E.; Beyer, H.; Old, G.; Marschmeyer, St.; Kuck, B.
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
14
EUV Blank Inspection
Autoren:
Peters, J. H.; Tonk, C.; Spriegel, D.; Han, Hak-Seung; Wurm, Stefan
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
15
Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique
Autoren:
Shao, Feng; Evanschitzky, Peter; Reibold, David; Erdmann, Andreas
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
16
High Resolution Patterning and Simulation on Mo/Si Multilayer for EUV Masks
Autoren:
Tsikrikas, N.; Patsis, G. P.; Raptis, I.; Gerardino, A.
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
17
High-resolution and high-precision pattern placement metrology for the 45 nm node and beyond
Autoren:
Klose, G.; Buttgereit, U.; Arnz, M.; Rosenkranz, N.
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
18
Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node
Autoren:
Häßler-Grohne, W.; Frase, C. G.; Gnieser, D.; Bosse, H.; Richter, J.; Wiswesser, A.
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
19
Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHR
Autoren:
Sier, Jean-Paul; Broadbent, William; Yu, Paul
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference
20
Introduction of new database reflected tritone algorithm for application in mask production
Autoren:
Schulmeyer, Thomas; Schmalfuss, Heiko; Heumann, Jan; Lang, Michael
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference